The fundamental 1/f noise and the hooge parameter in semiconductor quantum wires

被引:21
作者
Balandin, A [1 ]
Wang, KL
Svizhenko, A
Bandyopadhyay, S
机构
[1] Univ Calif Los Angeles, Dept Elect Engn, Device Res Lab, Los Angeles, CA 90095 USA
[2] Univ Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
关键词
1 f noise; magnetic field effects; phonons; quantum wires; silicon;
D O I
10.1109/16.766892
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have calculated the Hooge parameter alpha(H) characterizing fundamental 1/f noise in a free-standing intrinsic silicon quantum wire using microscopic noise theory. Our model takes into account quasi-one-dimensional confinement of both phonons and electrons. We find that at low temperatures, alpha(H) can be reduced significantly by an external magnetic field which suppresses large-angle electron scattering. This allows one to quench 1/f noise. Furthermore, a magnetic field provides a convenient tool to probe the source of noise in quantum wires, and, to a certain degree, test the validity of the microscopic mobility-fluctuation quantum noise model itself.
引用
收藏
页码:1240 / 1244
页数:5
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