Chemistry of cyclopentadiene on a Cu(100) surface: Detection of cyclopentadienyl (C5H5) species as reaction intermediates

被引:16
作者
Sun, DH
Bent, BE
Chen, JG
机构
[1] COLUMBIA UNIV, DEPT CHEM, NEW YORK, NY 10027 USA
[2] COLUMBIA UNIV, COLUMBIA RADIAT LAB, NEW YORK, NY 10027 USA
[3] EXXON RES & ENGN CO, CORP RES LABS, ANNANDALE, NJ 08801 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1997年 / 15卷 / 03期
关键词
D O I
10.1116/1.580636
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The desorption and reaction of cyclopentadiene on Cu(100) were studied by temperature-programmed desorption and Auger electron spectroscopy. The dehydrogenation of cyclopentadiene is significant at low exposures (less than or equal to 0.8 L), producing cyclopentadienyl (C-5-H-5) species as a reaction intermediate at less than or equal to 335 K. The C5H5 groups are stable on the Cu(100) surface up to similar to 600 K. At higher temperatures, cyclopentadienyl species undergo a self-hydrogenation reaction, with two-thirds of the C5H5 groups obtaining H from the others, and desorb from the surface as cyclopentadiene (C5H6) at similar to 620 K. The remaining one-third of the C5H5 groups dehydrogenates to form hydrocarbon fragments that can be best described as C5H3 species, which further decompose to produce residue surface carbon and molecular H-2 at similar to 700 K. The implication of the current work to the previous observation of carbon contamination in the chemical vapor deposition of Cu is also discussed. (C) 1997 American Vacuum Society.
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页码:1581 / 1585
页数:5
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