Incubation of laser ablation in fused silica with 5-fs pulses

被引：81

作者：

Lenzner, M

Krüger, J

Kautek, W

Krausz, F

机构：

[1] Tech Univ Vienna, A-1040 Vienna, Austria

[2] Bundesanstalt Materialforshung & Prufung, Lab Dunnschichttechnologien, D-12205 Berlin, Germany

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1999年 / 69卷 / 04期

关键词：

D O I：

10.1007/s003390051034

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The threshold fluences for laser-induced damage of fused silica with single 5-fs pulses from a Ti:sapphire laser system were determined by extrapolating the ablated volume to zero. These thresholds are about 4 times as high as the values previously obtained from multi-shot experiments. This result is interpreted in terms of an irreversible modification of the original material below the single-shot threshold (incubation).

引用

页码：465 / 466

页数：2

共 11 条

[1]

BAUERLE D, 1996, LASER PROCESSING CHE, P225

[2] LASER-INDUCED ELECTRIC BREAKDOWN IN SOLIDS [J].