FEMTOSECOND UV EXCIMER LASER ABLATION

[1] EXCIMER LASER ETCHING OF POLYIMIDE [J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (05) : 2036 - 2043

[2] OPTICAL AND PHOTOCHEMICAL FACTORS WHICH INFLUENCE ETCHING OF POLYMERS BY ABLATIVE PHOTODECOMPOSITION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (03): : 913 - 917

[3] TIME-RESOLVED PHOTOACOUSTIC STUDIES OF VASCULAR TISSUE ABLATION AT 3 LASER WAVELENGTHS [J]. APPLIED PHYSICS LETTERS, 1987, 50 (15) : 1019 - 1021

[4] TIME RESOLVED TRANSMISSION STUDIES OF POLY(METHYL METHACRYLATE) FILMS DURING ULTRAVIOLET-LASER ABLATIVE PHOTODECOMPOSITION [J]. JOURNAL OF APPLIED PHYSICS, 1987, 61 (05) : 2090 - 2092

[5] EXCIMER LASER ABLATION AND THERMAL COUPLING EFFICIENCY TO POLYMER-FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (04) : 1420 - 1422

[6] DEEP UV SUB-MICRON LITHOGRAPHY BY USING A PULSED HIGH-POWER EXCIMER LASER [J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (09) : 6489 - 6490

[7] EFFECTIVE DEEP ULTRAVIOLET PHOTOETCHING OF POLY(METHYL METHACRYLATE BY AN EXCIMER LASER [J]. APPLIED PHYSICS LETTERS, 1982, 40 (05) : 374 - 375

[8] TEMPORAL MEASUREMENTS OF PHOTOFRAGMENT ATTENUATION AT 248 NM IN THE LASER ABLATION OF POLYIMIDE IN AIR [J]. APPLIED PHYSICS LETTERS, 1987, 50 (16) : 1030 - 1032

[9] KUPER S, UNPUB

[10] KUPER S, IN PRESS

[1] EXCIMER LASER ETCHING OF POLYIMIDE [J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (05) : 2036 - 2043

[2] OPTICAL AND PHOTOCHEMICAL FACTORS WHICH INFLUENCE ETCHING OF POLYMERS BY ABLATIVE PHOTODECOMPOSITION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (03): : 913 - 917

[3] TIME-RESOLVED PHOTOACOUSTIC STUDIES OF VASCULAR TISSUE ABLATION AT 3 LASER WAVELENGTHS [J]. APPLIED PHYSICS LETTERS, 1987, 50 (15) : 1019 - 1021

[4] TIME RESOLVED TRANSMISSION STUDIES OF POLY(METHYL METHACRYLATE) FILMS DURING ULTRAVIOLET-LASER ABLATIVE PHOTODECOMPOSITION [J]. JOURNAL OF APPLIED PHYSICS, 1987, 61 (05) : 2090 - 2092

[5] EXCIMER LASER ABLATION AND THERMAL COUPLING EFFICIENCY TO POLYMER-FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (04) : 1420 - 1422

[6] DEEP UV SUB-MICRON LITHOGRAPHY BY USING A PULSED HIGH-POWER EXCIMER LASER [J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (09) : 6489 - 6490

[7] EFFECTIVE DEEP ULTRAVIOLET PHOTOETCHING OF POLY(METHYL METHACRYLATE BY AN EXCIMER LASER [J]. APPLIED PHYSICS LETTERS, 1982, 40 (05) : 374 - 375

[8] TEMPORAL MEASUREMENTS OF PHOTOFRAGMENT ATTENUATION AT 248 NM IN THE LASER ABLATION OF POLYIMIDE IN AIR [J]. APPLIED PHYSICS LETTERS, 1987, 50 (16) : 1030 - 1032

[9] KUPER S, UNPUB

[10] KUPER S, IN PRESS