High-density and size-controlled GaN self-assembled quantum dots grown by metalorganic chemical vapor deposition

被引:115
作者
Miyamura, M
Tachibana, K
Arakawa, Y
机构
[1] Univ Tokyo, Adv Sci & Technol Res Ctr, Meguro Ku, Tokyo 1538904, Japan
[2] Univ Tokyo, Inst Ind Sci, Meguro Ku, Tokyo 1538904, Japan
关键词
D O I
10.1063/1.1482416
中图分类号
O59 [应用物理学];
学科分类号
摘要
GaN self-assembled quantum dots (QDs) with high quality and high density have been grown by low-pressure metalorganic chemical vapor deposition under very low V/III ratios. In depositing over a critical thickness of four monolayer GaN, we observed a transition from two-dimensional to three-dimensional growth mode. The density of the QDs could be changed between 10(9) and 10(10) cm(-2). The typical diameter and height of the QDs were 20 and 2 nm, respectively. The size of the QDs was controlled to a considerable extent by changing the growth temperature and V/III ratio. Moreover, we observed two photoluminescence peaks from both the QDs and the wetting layer at room temperature. This result clearly demonstrates that the GaN QDs were formed with the Stranski-Krastanow growth mode. (C) 2002 American Institute of Physics.
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页码:3937 / 3939
页数:3
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