Magnetic behavior of lithographically patterned particle arrays (invited)

被引：119

作者：

Ross, CA ^{[1
]}

Haratani, S

Castaño, FJ

Hao, Y

Hwang, M

Shima, M

Cheng, JY

Vögeli, B

Farhoud, M

Walsh, M

Smith, HI

机构：

[1] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA

[2] MIT, Dept Elect Engn & Comp Sci, Cambridge, MA 02139 USA

[3] TDK Tech Ctr, Nagano, Japan

来源：

JOURNAL OF APPLIED PHYSICS | 2002年 / 91卷 / 10期

关键词：

D O I：

10.1063/1.1452247

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

This article reviews recent progress in the fabrication, characterization, and analysis of large area arrays of sub-100-nm magnetic particles made by lithographic techniques. Particles are made by electrodeposition, evaporation and liftoff, or sputtering and etching, leading to a wide range of shapes, compositions, and microstructures. The remanent states, magnetic hysteresis, and uniformity of the particles and the interparticle interactions will be discussed. (C) 2002 American Institute of Physics.

引用

页码：6848 / 6853

页数：6

共 58 条

[1] Magnetic properties and interactions of single-domain nanomagnets in a periodic array [J].