Correlation between surface oxygen content and microstructure of carbon nitride films

被引:8
作者
Szörényi, T
Tóth, AL
Bertóti, I
Antoni, F
Fogarassy, E
机构
[1] Res Grp Laser Phys, H-6701 Szeged, Hungary
[2] CNRS, PHASE, F-67037 Strasbourg 2, France
[3] Res Inst Tech Phys & Mat Sci, H-1525 Budapest, Hungary
[4] Hungarian Acad Sci, Chem Res Ctr, H-1525 Budapest, Hungary
基金
匈牙利科学研究基金会;
关键词
nitrides; x-ray photoelectron spectroscopy; scanning electron microscopy; pulsed laser deposition;
D O I
10.1016/S0925-9635(01)00559-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Carbon nitride films deposited by ArF excimer laser ablation of a graphite target in the 1-100-Pa N-2 pressure and 1.0-10-J cm(-2) fluence domains differ not only in their nitrogen but also in their oxygen content. The (surface) oxygen content correlates well with the compactness of the films. Oxygen contents below approximately 8 at.%, smooth surface, and mass densities above 2.2 g cm(-3) are typical of films deposited at low N-2 pressures (and high fluences) while deposition at/above 50 Pa results in films of oxygen contents exceeding 12 at.%, rough surface consisting of loosely connected cluster agglomerates, and density values at approximately 1.4 g cm(-3). At medium pressures high fluence processing is advantageous in terms of both nitrogen content and film morphology. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:1153 / 1156
页数:4
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