Electrochromic properties of NiOOH thin films prepared by reactive sputtering in an H2O atmosphere in various aqueous electrolytes

被引:19
作者
Abe, Yoshio [1 ]
Suzuki, Takahiro [1 ]
Kawamura, Midori [1 ]
Sasaki, Katsutaka [1 ]
Itoh, Hidenobu [1 ]
机构
[1] Kitami Inst Technol, Dept Mat Sci & Engn, Kitami, Hokkaido 0908507, Japan
基金
日本科学技术振兴机构;
关键词
Nickel oxyhydroxide thin film; Electrochromic; Aqueous electrolyte solution; COATINGS; DEVICES;
D O I
10.1016/j.solmat.2011.05.018
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Nickel oxyhydroxide (NiOOH) thin films were prepared by reactive sputtering using H2O as a reactive gas, and the electrochromic (EC) properties of these thin films were investigated in alkaline, neutral, and acidic aqueous electrolyte solutions. A stable EC cycling of up to 100 cycles was obtained for the NiOOH thin films in electrolyte solutions with a wide pH range of 4.1-13.5. However, the EC cycling degraded drastically after several tens of cycles in an electrolyte with pH=2.0. In the stable pH region, the NiOOH films exhibited a large transmittance change from approximately 30-90%, although the response speed slowed with decreasing pH of the electrolytes. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:38 / 42
页数:5
相关论文
共 28 条
[1]   Electrochromic properties of Ni oxide thin films in diluted acidic electrolytes and their stability [J].
Abe, Yoshio ;
Lee, Se-Hee ;
Zayim, Esra Ozkan ;
Tracy, C. Edwin ;
Pitts, J. Roland ;
Deb, Satyen K. .
SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2008, 92 (02) :160-163
[2]   Effect of O2 flow concentration during reactive sputtering of Ni oxide thin films on their electrochemical and electrochromic properties in aqueous acidic and basic electrolyte solutions [J].
Abe, Yoshio ;
Lee, Se-Hee ;
Zayim, Esra Ozkan ;
Tracy, C. Edwin ;
Pitts, J. Roland ;
Deb, Satyen K. .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (10A) :7780-7783
[3]   Electrochromic properties of sputtered Ni oxide thin films in acidic KCl+H2SO4 aqueous solutions [J].
Abe, Yoshio ;
Lee, Se-Hee ;
Tracy, C. Edwin ;
Pitts, J. Roland ;
Deb, Satyen K. .
ELECTROCHEMICAL AND SOLID STATE LETTERS, 2006, 9 (08) :J31-J33
[4]   Effects of Sputtering Gas Pressure on Electrochromic Properties of Ni Oxyhydroxide Thin Films Prepared by Reactive Sputtering in H2O Atmosphere [J].
Abe, Yoshio ;
Ueta, Hideaki ;
Obata, Takeshi ;
Kawamura, Midon ;
Sasaki, Katsutaka ;
Itoh, Hidenobu .
JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (11)
[5]   EFFECT OF DEPOSITION PRESSURE ON THE MICROSTRUCTURE AND ELECTROCHROMIC PROPERTIES OF ELECTRON-BEAM-EVAPORATED NICKEL-OXIDE FILMS [J].
AGRAWAL, A ;
HABIBI, HR ;
AGRAWAL, RK ;
CRONIN, JP ;
ROBERTS, DM ;
CARONPOPOWICH, R ;
LAMPERT, CM .
THIN SOLID FILMS, 1992, 221 (1-2) :239-253
[6]   The effect of RF power on the electrochromic response time of sputter-deposited Ni oxide films [J].
Ahn, KS ;
Nah, YC ;
Sung, YE .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2002, 41 (5A) :L533-L535
[7]   Sputter deposited electrochromic films and devices based on these:: Progress on nickel-oxide-based films [J].
Avendano, A. ;
Azens, A. ;
Niklasson, G. A. ;
Granqvist, C. G. .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2007, 138 (02) :112-117
[8]   Electrochromic devices embodying W oxide/Ni oxide tandem films [J].
Azens, A ;
Vaivars, G ;
Veszelei, M ;
Kullman, L ;
Granqvist, CG .
JOURNAL OF APPLIED PHYSICS, 2001, 89 (12) :7885-7887
[9]   Spectroelectrochemistry of nanostructured NiO [J].
Boschloo, G ;
Hagfeldt, A .
JOURNAL OF PHYSICAL CHEMISTRY B, 2001, 105 (15) :3039-3044
[10]   Pulsed Laser-Deposited nickel oxide thin films as electrochromic anodic materials [J].
Bouessay, I ;
Rougier, A ;
Beaudoin, B ;
Leriche, JB .
APPLIED SURFACE SCIENCE, 2002, 186 (1-4) :490-495