Growth of giant grains in silver thin films

被引:46
作者
Greiser, J
Müller, D
Müllner, P
Thompson, CV
Arzt, E
机构
[1] Max Planck Inst Met Res, D-70174 Stuttgart, Germany
[2] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
关键词
grain growth; texture; microstructure; thin films; physical vapor deposition (PVD);
D O I
10.1016/S1359-6462(99)00205-5
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Three regimes of behavior were observed in thin silver films annealed between 400 and 800 °C, depending on the film thickness: for thicknesses up to 0.6 μm, grain growth was controlled by surface energy minimization, resulting in a 〈111〉 texture and small grains; for thicknesses between 1.0 and 1.5 μm, strain energy minimization came into play, resulting in the abnormal growth of 〈001〉 oriented grains with a bimodal final grain size distribution; and in the third regime, a very limited number of grains grew to coalescence, leading to a very large final grain size and a transformation of the film texture from a strong 〈111〉 texture to a very strong 〈001〉 texture.
引用
收藏
页码:709 / 714
页数:6
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