共 21 条
[3]
FORRISTER RM, 1995, B AM PHYS SOC, V40, P1556
[8]
Negative ion density in inductively coupled chlorine plasmas
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1996, 14 (04)
:2158-2162
[9]
HEBNER GA, IN PRESS J VAC SCI A
[10]
REACTIVE ION ETCHING OF COPPER WITH BCL3 AND SICL4 - PLASMA DIAGNOSTICS AND PATTERNING
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1994, 12 (04)
:1259-1264