Surface morphology development during ion sputtering: Roughening or smoothing?

被引:25
作者
Csahok, Z
Farkas, Z
Menyhard, M
Gergely, G
Daroczi, CS
机构
[1] HUNGARIAN ACAD SCI, TECH PHYS RES INST, H-1325 BUDAPEST, HUNGARY
[2] EOTVOS LORAND UNIV, DEPT ATOM PHYS, H-1088 BUDAPEST, HUNGARY
[3] HUNGARIAN ACAD SCI, KFKI, MAT RES INST, H-1525 BUDAPEST, HUNGARY
基金
匈牙利科学研究基金会;
关键词
ion bombardment; ion-solid interaction; surface structure; morphology; roughness; and topography;
D O I
10.1016/0039-6028(96)00772-8
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We report on STM studies of ion-sputtered surfaces, applying sputtering conditions which were shown to produce a relatively smooth surface. The height correlation function was calculated for the nickel layer in both the as-received and sputtered conditions. The large-scale roughness of the as-received specimen was reduced by ion sputtering according to expectations derived from Auger depth profiling. On the other hand, the small-scale roughness was increased due to sputtering. Self-affine scaling regions are identified, and the exponents are compared to theoretical and numerical results.
引用
收藏
页码:L600 / L604
页数:5
相关论文
共 16 条
[1]   NUMERICAL-SOLUTION OF A CONTINUUM EQUATION FOR INTERFACE GROWTH IN 2+1 DIMENSIONS [J].
AMAR, JG ;
FAMILY, F .
PHYSICAL REVIEW A, 1990, 41 (06) :3399-3402
[2]   RADIATION-DAMAGE IN ION-MILLED SPECIMENS - CHARACTERISTICS, EFFECTS AND METHODS OF DAMAGE LIMITATION [J].
BARBER, DJ .
ULTRAMICROSCOPY, 1993, 52 (01) :101-125
[3]   AUGER DEPTH PROFILE ANALYSIS OF DEEPLY BURIED INTERFACES [J].
BARNA, A ;
MENYHARD, M .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1994, 145 (02) :263-274
[4]   IMPROVED DEPTH RESOLUTION OF AES IN-DEPTH PROFILING [J].
BARNA, A ;
SULYOK, A ;
MENYHARD, M .
SURFACE AND INTERFACE ANALYSIS, 1992, 19 (1-12) :77-79
[5]  
BARNA A, 1990, MATER RES SOC S P, V254, P3
[6]   ROUGHENING INSTABILITY AND EVOLUTION OF THE GE(001) SURFACE DURING ION SPUTTERING [J].
CHASON, E ;
MAYER, TM ;
KELLERMAN, BK ;
MCILROY, DT ;
HOWARD, AJ .
PHYSICAL REVIEW LETTERS, 1994, 72 (19) :3040-3043
[7]   LIMITING FACTORS FOR SECONDARY-ION MASS-SPECTROMETRY PROFILING [J].
CIRLIN, EH ;
VAJO, JJ ;
HASENBERG, TC .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (01) :269-275
[8]   DYNAMIC SCALING OF ION-SPUTTERED SURFACES [J].
CUERNO, R ;
BARABASI, AL .
PHYSICAL REVIEW LETTERS, 1995, 74 (23) :4746-4749
[9]   SUBMICRON-SCALE SURFACE ROUGHENING INDUCED BY ION-BOMBARDMENT [J].
EKLUND, EA ;
BRUINSMA, R ;
RUDNICK, J ;
WILLIAMS, RS .
PHYSICAL REVIEW LETTERS, 1991, 67 (13) :1759-1762
[10]   INTERLABORATORY COMPARISON OF THE DEPTH RESOLUTION IN SPUTTER DEPTH PROFILING OF NI/CR MULTILAYERS WITH AND WITHOUT SAMPLE ROTATION USING AES, XPS AND SIMS [J].
HOFMANN, S ;
ZALAR, A ;
CIRLIN, EH ;
VAJO, JJ ;
MATHIEU, HJ ;
PANJAN, P .
SURFACE AND INTERFACE ANALYSIS, 1993, 20 (08) :621-626