Degradation of an X-K-u band GaAs/AlGaAs power HBT MMIC under RF stress

被引:10
作者
Gupta, A
Ali, F
Dawson, D
Smith, P
机构
[1] Advanced Technology Center, Westinghouse Electric Corporation, Baltimore
来源
IEEE MICROWAVE AND GUIDED WAVE LETTERS | 1996年 / 6卷 / 01期
关键词
D O I
10.1109/75.482066
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper summarizes the observed degradation in the performance of a high-efficiency X-K-u band 1-W HBT power MMIC operating under similar to 2 dB compression for an extended period, The main finding of this study is that no new degradation mechanisms appeared, even under severe RF stress; the device degraded in the same manner as with de stress only, The only significant change in device characteristics was increased base leakage current that resulted in a monotonic reduction in current gain after an initial period of stability. Output power of the MMIC remained essentially unchanged even after current gain had dropped to 60% of its initial value. RF properties of the device, both small and large signal, showed little change even after severe deterioration of de characteristics. The results of this study suggest that HBT reliability can be effectively evaluated for most applications by applying only de stress to the device,
引用
收藏
页码:43 / 45
页数:3
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