EMITTER BALLASTING RESISTOR DESIGN FOR, AND CURRENT HANDLING CAPABILITY OF ALGAAS/GAAS POWER HETEROJUNCTION BIPOLAR-TRANSISTORS

被引:83
作者
GAO, G
UNLU, MS
MORKOC, H
BLACKBURN, DL
机构
[1] UNIV ILLINOIS, MAT RES LAB, URBANA, IL 61801 USA
[2] NATL INST STAND & TECHNOL, DIV SEMICOND ELECTR, GAITHERSBURG, MD 20899 USA
基金
美国国家科学基金会;
关键词
D O I
10.1109/16.69894
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A systematic investigation of the emitter ballasting resistor for power Heterojunction Bipolar Transistors (HBT's) is presented. The current handling capability of power HBT's is found to improve with ballasting resistance. An equation for the optimal ballasting resistance is presented, where the effects of thermal conductivity of the substrate material and the temperature coefficient of the ballasting resistor are taken into account. Current levels of 400 to 800 mA/mm of emitter periphery at case temperatures of 25 to -80-degrees-C for power AlGaAs/GaAs HBT's have been obtained using an on-chip lightly doped GaAs emitter ballasting resistor. Device temperature has been measured using both an infrared micro-radiometer and temperature-sensitive electrical parameters. Steady-state and transient thermal modeling were also performed. Although the measured temperature is spatially nonuniform, the modeling results show that such nonuniformities would occur for a uniform current distribution, as would be expected for an HBT with emitter ballasting resistors.
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页码:185 / 196
页数:12
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