Diamond waveguides fabricated by reactive ion etching

被引:95
作者
Hiscocks, Mark P. [1 ]
Ganesan, Kumaravelu
Gibson, Brant C. [2 ]
Huntington, Shane T.
Ladouceur, Francois [1 ]
Prawer, Steven [2 ]
机构
[1] UNSW, Sch EE&T, Sydney, NSW 2052, Australia
[2] Univ Melbourne, Sch Phys, Quantum Commun Victoria, Melbourne, Vic 3010, Australia
关键词
Reactive ion etching - Ions - Single crystals - Fabrication - Ion beams - Ridge waveguides;
D O I
10.1364/OE.16.019512
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We demonstrate for the first time the feasibility of all-diamond integrated optic devices over large areas using a combination of photolithography, reactive ion etching (RIE) and focused ion beam (FIB) techniques. We confirm the viability of this scalable process by demonstrating guidance in a two-moded ridge waveguide in type 1b single crystal diamond. This opens the door to the fabrication of a diamond-based optical chip integrating functional elements such as X-crossings, Y-junctions, evanescent couplers, Bragg reflectors/couplers and various interferometers. (C) 2008 Optical Society of America
引用
收藏
页码:19512 / 19519
页数:8
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