ESCA Microscopy at ELETTRA: What it is like to perform spectromicroscopy experiments on a third generation synchrotron radiation source

被引:117
作者
Marsi, M [1 ]
Casalis, L [1 ]
Gregoratti, L [1 ]
Gunther, S [1 ]
Kolmakov, A [1 ]
Kovac, J [1 ]
Lonza, D [1 ]
Kiskinova, M [1 ]
机构
[1] SINCROTRONE TRIESTE,I-34012 TRIESTE,ITALY
关键词
synchroton spectromicroscopy; elemental and chemical imaging; topographical effects; metal semiconductor interfaces; local changing effects;
D O I
10.1016/S0368-2048(97)00010-8
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
We present ESCA Microscopy, the first X-ray microscopy beamline operating on ELETTRA, the third generation synchrotron radiation source in Trieste, Italy. ESCA Microscopy is an advanced user facility open to the international scientific community; its operation is based on the use of a Fresnel zone plate to demagnify to submicrometre dimensions the photon beam emitted by an undulator in the 200-1000 eV energy range. ESCA Microscopy was designed as a scanning photoemission microscope especially suited for surface analysis; it also operates in transmission mode and should find many applications in materials science, chemistry and physics. We describe here the beamline experimental setup and present some recent results obtained during the first months of operation. While so doing, we will outline certain spectroscopic aspects and point out some operational problems that are typical of scanning photoemission microscopy, a technique which should find in advanced sources such as ELETTRA the right conditions to achieve maturity. (C) 1997 Elsevier Science B.V.
引用
收藏
页码:73 / 83
页数:11
相关论文
共 39 条
[1]   IMAGES OF A MICROELECTRONIC DEVICE WITH THE X1-SPEM, A 1ST GENERATION SCANNING PHOTOEMISSION MICROSCOPE AT THE NATIONAL SYNCHROTRON LIGHT-SOURCE [J].
ADE, H ;
KIRZ, J ;
HULBERT, S ;
JOHNSON, E ;
ANDERSON, E ;
KERN, D .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (03) :1902-1906
[2]  
ANDERSON EH, 1992, XRAY MICROSCOPY, V3, P75
[3]  
ATTWOOD D, 1994, XRAY MICROSCOPY, V4, P20
[4]   HIGH-RESOLUTION FRESNEL ZONE PLATES FOR SOFT X-RAYS [J].
BACIOCCHI, M ;
MAGGIORA, R ;
GENTILI, M .
MICROELECTRONIC ENGINEERING, 1994, 23 (1-4) :101-104
[5]   THE POSSIBILITIES FOR ANALYTICAL METHODS IN PHOTOEMISSION AND LOW-ENERGY MICROSCOPY [J].
BAUER, E .
ULTRAMICROSCOPY, 1991, 36 (1-3) :52-62
[6]  
BIFONE A, UNPUB
[7]   ESCA MICROSCOPY BEAMLINE AT ELETTRA [J].
CASALIS, L ;
JARK, W ;
KISKINOVA, M ;
LONZA, D ;
MELPIGNANO, P ;
MORRIS, D ;
ROSEL, R ;
SAVOIA, A ;
ABRAMI, A ;
FAVA, C ;
FURLAN, P ;
PUGLIESE, R ;
VIVODA, D ;
SANDRIN, G ;
WEI, FQ ;
CONTARINI, S ;
DEANGELIS, L ;
GARIAZZO, C ;
NATALETTI, P ;
MORRISON, GR .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1995, 66 (10) :4870-4875
[8]  
CASALIS L, 1996, IN PRESS SURF INT AN
[9]  
CAUTERO G, UNPUB NUCL INSTRUM M
[10]   MICROSCOPIC-SCALE LATERAL INHOMOGENEITIES OF THE PHOTOEMISSION RESPONSE OF CLEAVED GAAS [J].
CERRINA, F ;
RAYCHAUDHURI, AK ;
NG, W ;
LIANG, S ;
SINGH, S ;
WELNAK, JT ;
WALLACE, JP ;
CAPASSO, C ;
UNDERWOOD, JH ;
KORTRIGHT, JB ;
PERERA, RCC ;
MARGARITONDO, G .
APPLIED PHYSICS LETTERS, 1993, 63 (01) :63-65