Pulsed photoelectron microscope for imaging laser-induced nanosecond processes

被引:22
作者
Bostanjoglo, O
Weingartner, M
机构
[1] Optisches Institut, Technischen Universität Berlin, 10623 Berlin
关键词
D O I
10.1063/1.1148168
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
A flash photoelectron microscope, driven by 4 ns KrF excimer laser pulses, is introduced. The microscope is equipped with a solid state laser for in situ processing of metals with focused nanosecond pulses. Transient stages during laser-induced melting, solidification, and alloying of Al films on bulk substrates have been imaged with an exposure time of 4 ns. The photoelectron microscope is proved to be a powerful real-time probe for fast-proceeding incipient laser-induced damage, sensing changes of surfaces being too shallow to be detected by light interference and electron scanning microscopy. The combined time/space resolution is limited by lens aberrations, space charge, shot noise, and detector efficiency to about 4 ns/1.3 mu m, at present. (C) 1997 American Institute of Physics.
引用
收藏
页码:2456 / 2460
页数:5
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