Carrier concentration and mobility in GaN epilayers on sapphire substrate studied by infrared reflection spectroscopy

被引:36
作者
Li, ZF
Lu, W
Ye, HJ
Chen, ZH
Yuan, XZ
Dou, HF
Shen, SC
Li, G
Chua, SJ
机构
[1] Chinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R China
[2] Natl Univ Singapore, Inst Mat Res & Engn, Singapore 119260, Singapore
关键词
D O I
10.1063/1.371112
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report the measurement of carrier concentration and mobility of metalorganic chemical vapor deposited GaN thin films on the sapphire substrate by an infrared reflection technique. By fitting with the experimental data we obtain all the parameters of the lattice vibration oscillators and of the plasmon. From the plasmon frequency and the damping constant we have derived the carrier concentration and the electron mobility. The concentration agrees with the Hall data very well while the mobility values are smaller than that of the Hall measurement by a factor of about 0.5. We attribute such mobility lowering to the increase of scattering for the electrons coupling with the incident photons. (C) 1999 American Institute of Physics. [S0021-8979(99)01617-5].
引用
收藏
页码:2691 / 2695
页数:5
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