Effects of high potential barrier on InAs quantum dots and wetting layer

被引:38
作者
Kim, JS
Yu, PW
Leem, JY [1 ]
Jeon, M
Noh, SK
Lee, JI
Kim, GH
Kang, SK
Kim, JS
Kim, SG
机构
[1] Inje Univ, Dept Opt Engn, Kimhae 621749, South Korea
[2] Kwangju Inst Sci & Technol, Dept Informat & Commun, Kwangju 500712, South Korea
[3] Korea Res Inst Stand & Sci, Mat Evaluat Ctr, Taejon 305340, South Korea
[4] Yeungnam Univ, Dept Phys, Kyungsan 729749, South Korea
[5] Joongbu Univ, Dept Informat & Telecommun, Gumsan Gun 132940, South Korea
关键词
D O I
10.1063/1.1464230
中图分类号
O59 [应用物理学];
学科分类号
摘要
Effects of a thin AlAs layer (1 nm) with different position on InAs quantum dots (QDs) and wetting layer have been investigated by transmission electron microscopy (TEM), photoluminescence (PL), and photoreflectance (PR). The PL peak position of InAs QDs directly grown on the thin AlAs is blueshifted from that of InAs QDs grown on the GaAs layer by 171 meV mainly due to the high potential barrier and reduced dot size shown in the TEM image. As the additional GaAs layer (1 and 2 nm) is inserted on top of the AlAs layer, the PL peak position is systematically shifted toward longer wavelength with increase in the thickness. Temperature dependent PL of QD samples shows that a thin AlAs layer significantly influences the thermal activation energy. The wetting layer related peak in PR spectra is changed to lower energy with increase in the thickness of an additional GaAs layer, which is mainly caused by the reduction in the effects of the AlAs layer. (C) 2002 American Institute of Physics.
引用
收藏
页码:5055 / 5059
页数:5
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