Properties of amine-containing coatings prepared by plasma polymerization

被引:79
作者
Choukourov, A
Biederman, H
Kholodkov, I
Slavinska, D
Trchova, M
Hollander, A
机构
[1] Charles Univ, Fac Math & Phys, Dept Macromol Phys, CR-18000 Prague 8, Czech Republic
[2] Fraunhofer Inst Angew Polymerforsch, D-14476 Golm, Germany
关键词
plasma polymerization; thin films; functionalization of polymers;
D O I
10.1002/app.13387
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 [高分子化学与物理]; 080501 [材料物理与化学]; 081704 [应用化学];
摘要
Two monomers, ethylenediamine (EDA) and diaminocyclohexane (DACH), were plasma-polymerized in continuous-wave (CW) and pulse modes. The influence of different plasma parameters on the deposition rate and film composition were investigated in detail and the changes in aminofunctionalization with varying pulse parameters were examined by FTIR, ESCA, and chemical-derivatization techniques. It was shown that a varying duty cycle does not produce a considerable effect on the retention of amine groups into the film, while power and t(on) play a significant role in the polymerization process. (C) 2004 Wiley Periodicals, Inc.
引用
收藏
页码:979 / 990
页数:12
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