Direct writing of low Tc superconductor-normal metal-superconductor junctions using a focused ion beam

被引：30

作者：

Moseley, RW ^{[1
]}

Booij, WE ^{[1
]}

Tarte, EJ ^{[1
]}

Blamire, MG ^{[1
]}

机构：

[1] Univ Cambridge, IRC Superconduct, Cambridge CB3 0HE, England

来源：

APPLIED PHYSICS LETTERS | 1999年 / 75卷 / 02期

关键词：

D O I：

10.1063/1.124342

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Using a focused ion beam, we have produced superconductor-normal metal-superconductor junctions by controllably removing a portion of the top layer of a patterned superconductor-normal metal thin film. The high-quality junctions showed Josephson coupling which scaled qualitatively with barrier properties and temperature as expected. The largest product of a junction's critical current and the normal state resistance measured is 98 mu V at 4.2 K. The method has good reproducibility and could be exploited in a number of superconducting electronics applications. (C) 1999 American Institute of Physics. [S0003-6951(99)04728-2].

引用

页码：262 / 264

页数：3

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