MODELS FOR CONTACTS TO PLANAR DEVICES

[1] BERGER HH, 1969, DIGEST TECH PAP ISSC, P160

[2] CONTACT RESISTANCE IN DIFFUSED RESISTORS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (03) : 368 - &

[3] DANDREA G, 1970, IEEE T ELECTRON DEV, VED17, P484

[4] ELECTRICAL CONTACTS TO SILICON [J]. SOLID-STATE ELECTRONICS, 1965, 8 (10) : 831 - +

[5] A 2-DIMENSIONAL MATHEMATICAL ANALYSIS OF DIFFUSED SEMICONDUCTOR RESISTOR [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1968, 12 (03) : 242 - +

[6] MEASUREMENT OF CONTACT RESISTANCE BETWEEN METAL AND DIFFUSION LAYER IN SI PLANAR ELEMENTS [J]. SOLID-STATE ELECTRONICS, 1969, 12 (11) : 879 - &

[7] MURRMANN H, 1969, IEEE T ELECTRON DEVI, VED16, P1022

[8] MURRMANN H, 1969, DIGEST TECH PAP ISSC, P162

[9] CALCULATION OF CURRENT DENSITY IN CONTACTS OF A THIN FILM RESISTOR [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1970, 14 (01) : 66 - +

[10] Schwartz B., 1969, OHMIC CONTACTS SEMIC

[1] BERGER HH, 1969, DIGEST TECH PAP ISSC, P160

[2] CONTACT RESISTANCE IN DIFFUSED RESISTORS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (03) : 368 - &

[3] DANDREA G, 1970, IEEE T ELECTRON DEV, VED17, P484

[4] ELECTRICAL CONTACTS TO SILICON [J]. SOLID-STATE ELECTRONICS, 1965, 8 (10) : 831 - +

[5] A 2-DIMENSIONAL MATHEMATICAL ANALYSIS OF DIFFUSED SEMICONDUCTOR RESISTOR [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1968, 12 (03) : 242 - +

[6] MEASUREMENT OF CONTACT RESISTANCE BETWEEN METAL AND DIFFUSION LAYER IN SI PLANAR ELEMENTS [J]. SOLID-STATE ELECTRONICS, 1969, 12 (11) : 879 - &

[7] MURRMANN H, 1969, IEEE T ELECTRON DEVI, VED16, P1022

[8] MURRMANN H, 1969, DIGEST TECH PAP ISSC, P162

[9] CALCULATION OF CURRENT DENSITY IN CONTACTS OF A THIN FILM RESISTOR [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1970, 14 (01) : 66 - +

[10] Schwartz B., 1969, OHMIC CONTACTS SEMIC