Analysis of the tuning sensitivity of silicon-on-insulator optical ring resonators

被引:45
作者
Baehr-Jones, T [1 ]
Hochberg, M
Walker, C
Chan, E
Koshinz, D
Krug, W
Scherer, A
机构
[1] CALTECH, Dept Elect Engn, Pasadena, CA 91125 USA
[2] Boeing Co, Renton, WA 98055 USA
[3] CALTECH, Dept Appl Phys & Phys, Pasadena, CA 91125 USA
关键词
integrated optics; integrated optoelectronics; optical waveguide; photothermal effects;
D O I
10.1109/JLT.2005.853147
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
High-quality-factor optical ring resonators have recently been fabricated in thin silicon-on-insulator (SOI). Practical applications of such devices will require careful tuning of the precise location of the resonance peaks. In particular, one often wants to maximize the resonance shift due to the presence of an active component and minimize the resonance shift due to temperature changes. This paper presents a semianalytic formalism that allows the prediction of such resonance shifts from the waveguide geometry. This paper also presents the results of experiments that show the tuning behavior of several ring resonators and find that the proposed semianalytic formalism agrees with the observed behavior.
引用
收藏
页码:4215 / 4221
页数:7
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