112-GHz collector-up Ge/GaAs heterojunction bipolar transistors with low turn-on voltage

被引:5
作者
Kawanaka, M
Iguchi, N
Sone, J
机构
[1] Fundamental Research Laboratories, NEC Corporation, Tsukuba, Ibaraki
关键词
D O I
10.1109/16.491241
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper reports small-sized collector-up Ge/GaAs heterojunction bipolar transistors (HBT's) operating at low power and high frequency. A heavily B-doped Ge base-layer and a newly-developed self aligned process reduce the base resistance and the parasitic elements, Intrinsic base resistance is 50 Omega/square; this is the lowest value reported for bipolar transistors, With limiting the active emitter area through B ion implantation these collector-up HBT's with a collector size of 2 x 5 mu m(2) exhibit a current gain of 60, They exhibit a maximum oscillation frequency f(max) of 112 GHz with an associated current gain cutoff frequency f(tau) of 25 GHz, The large value of f(max), exceeding 100 GHz, is attributed to the extremely low base resistance caused by the heavily B-doped base-layer and the self-aligned process and to the low base-collector capacitance expected from the collector-up structure. The turn-on voltage of these HBT's is approximately 0.7 V smaller than that of AlGaAs/GaAs HBT's, These results show that these HBT's have excellent potential for low-power dissipation circuits.
引用
收藏
页码:670 / 675
页数:6
相关论文
共 22 条
[1]  
ASBECK PM, 1991, HIGH SPEED SEMICONDU, P335
[2]   PNP GAAS/GE/GE PHOTOTRANSISTOR GROWN BY MOLECULAR-BEAM EPITAXY - IMPLICATIONS FOR BIPOLAR AND HOT-ELECTRON TRANSISTORS [J].
CHAND, N ;
KLEM, J ;
MORKOC, H .
APPLIED PHYSICS LETTERS, 1986, 48 (07) :484-486
[3]   A SCALED 0.25-MU-M BIPOLAR TECHNOLOGY USING FULL E-BEAM LITHOGRAPHY [J].
CRESSLER, JD ;
WARNOCK, J ;
COANE, PJ ;
CHIONG, KN ;
ROTHWELL, ME ;
JENKINS, KA ;
BURGHARTZ, JN ;
PETRILLO, EJ ;
MAZZEO, NJ ;
MEGDANIS, AC ;
HOHN, FJ ;
THOMSON, MG ;
SUN, JYC ;
TANG, DD .
IEEE ELECTRON DEVICE LETTERS, 1992, 13 (05) :262-264
[4]   BAND OFFSET VARIATIONS AT GE/GAAS (100) INTERFACES [J].
DAHMEN, M ;
RAU, U ;
KAWANAKA, M ;
SONE, J ;
WERNER, JH .
APPLIED PHYSICS LETTERS, 1993, 62 (03) :261-263
[5]   ACTIVE AREA LIMITATION OF GE-GAAS HETEROJUNCTIONS BY MEANS OF B-ION IMPLANTATION [J].
ISHIZUKA, F ;
SUGIOKA, K ;
ITOH, T .
JOURNAL OF APPLIED PHYSICS, 1986, 59 (02) :495-498
[6]   REALIZATION OF A GAAS-GE WIDE BAND GAP EMITTERTRANSISTOR [J].
JADUS, DK ;
FEUCHT, DL .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1969, ED16 (01) :102-&
[7]   ION-IMPLANTATION OF BORON IN GERMANIUM [J].
JONES, KS ;
HALLER, EE .
JOURNAL OF APPLIED PHYSICS, 1987, 61 (07) :2469-2477
[8]   DOPING PROPERTIES OF GE ON GAAS (100) GROWN BY MBE [J].
KAWANAKA, M ;
SONE, J .
JOURNAL OF CRYSTAL GROWTH, 1989, 95 (1-4) :421-424
[9]   CURRENT-VOLTAGE CHARACTERISTICS OF P-GE/N-GAAS HETEROJUNCTION DIODES GROWN BY MOLECULAR-BEAM EPITAXY [J].
KAWANAKA, M ;
SONE, JI .
JOURNAL OF ELECTRONIC MATERIALS, 1990, 19 (06) :575-580
[10]  
KAWANAKA M, 1995, NEC RES DEV, V36, P165