Influence of deposition parameters on RF sputtered DLC thin films

被引:1
作者
Caneve, L [1 ]
Rizzo, A [1 ]
Sarto, F [1 ]
Scaglione, S [1 ]
机构
[1] CR Casaccia, ENEA, I-00060 Rome, Italy
来源
ADVANCES IN OPTICAL INTERFERENCE COATINGS | 1999年 / 3738卷
关键词
diamond like carbon; RF sputtering; optical coatings; hardness;
D O I
10.1117/12.360099
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Diamond like carbon (DLC) can be an ideal candidate as coating material for optical components owing to its high hardness value, chemical inertness and high transparency in the infrared spectral region. DLC thin films have been deposited by RF magnetron sputtering from a graphite target in argon atmosphere without hydrogen on glass and silicon substrates in order to study the influence of some parameters on the mechanical and optical properties. Increasing the power input values, from 100W to 400W, the DLC films compactness increases too as it can be deduced from the raise in this range of power of both hardness and refractive index values, calculated by microindentations size and reflectance and transmittance spectrophotometer measurements respectively. Moreover, a set of samples was deposited at different substrate temperatures and at the highest used value a lower value of hardness and refractive index as well are obtained. The possibility to correlate the films compactness to their absorption humidity has been investigated by means of the infrared transmittance spectra analysis. Densifying effect of RF sputtered DLC thin films examined in this work seems to be related, in conclusion, to the power input increasing rather than to the substrate temperature.
引用
收藏
页码:34 / 39
页数:6
相关论文
共 10 条
[1]  
BUNSHAH RF, 1982, DEPOSITION TECHNOLOG, pCH5
[2]   EFFECT OF DEPOSITION PARAMETERS ON THE OPTICAL-PROPERTIES AND MICROSTRUCTURE OF RADIO-FREQUENCY MAGNETRON SPUTTERED ZNSE FILMS [J].
CANEVE, L ;
SCAGLIONE, S ;
MARTELLI, S ;
EMILIANI, G .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (03) :515-518
[3]   INFLUENCE OF ION MASS AND ION ENERGY ON MICROSTRUCTURE OF ION-ASSISTED DEPOSITED ZINC SELENIDE THIN-FILMS [J].
CANEVE, L ;
SCAGLIONE, S ;
FLORI, D ;
MARTELLI, S .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1994, 12 (04) :1614-1617
[4]  
CANEVE L, 1998, 9 EUR C DIAM DIAM LI
[5]   EFFECT OF RF-SPUTTERING PARAMETERS ON ZNO FILMS DEPOSITED ONTO GAAS SUBSTRATES [J].
LEE, CT ;
SU, YK ;
WANG, HM .
THIN SOLID FILMS, 1987, 150 (2-3) :283-289
[6]  
MORT J, 1986, PLASMA DEPOSITED THI, P115
[7]  
NETTERFIELD RP, 1986, SPIE, V678, P14
[8]  
PULKER HK, 1984, COATING GLASS, pCH8
[9]   MECHANICAL-PROPERTIES OF COATED COPPER MIRRORS [J].
SCAGLIONE, S ;
CANEVE, L ;
EMILIANI, G .
VACUUM, 1990, 41 (4-6) :1305-1307
[10]   The dependence of hardness on the density of amorphous alumina thin films by PECVD [J].
Wang, HL ;
Lin, CH ;
Hon, MH .
THIN SOLID FILMS, 1997, 310 (1-2) :260-264