EFFECT OF RF-SPUTTERING PARAMETERS ON ZNO FILMS DEPOSITED ONTO GAAS SUBSTRATES

被引：39

作者：

LEE, CT ^{[1
]}

SU, YK ^{[1
]}

WANG, HM ^{[1
]}

机构：

[1] NATL CHENG KUNG UNIV,DEPT ELECT ENGN,TAINAN,TAIWAN

来源：

THIN SOLID FILMS | 1987年 / 150卷 / 2-3期

关键词：

D O I：

10.1016/0040-6090(87)90101-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：283 / 289

页数：7

共 14 条

[1]

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FAHRENBRUCH, AL ;

BUBE, RH .

THIN SOLID FILMS, 1986, 136 (01) :1-10

[3] HIGHLY ORIENTED ZINC-OXIDE FILMS GROWN BY THE OXIDATION OF DIETHYLZINC [J].

GHANDHI, SK ;

FIELD, RJ ;

SHEALY, JR .

APPLIED PHYSICS LETTERS, 1980, 37 (05) :449-451

[4] STRUCTURES AND ELECTRICAL PROPERTIES OF ZINC OXIDE FILMS PREPARED BY LOW PRESSURE SPUTTERING SYSTEM [J].

HADA, T ;

WASA, K ;

HAYAKAWA, S .

THIN SOLID FILMS, 1971, 7 (02) :135-&

[5]

KRZESINSKI A, 1986, THIN SOLID FILMS, V136, P111

[6] OPTICAL-GYROSCOPE APPLICATION OF EFFICIENT CROSSED-CHANNEL ACOUSTOOPTIC DEVICES [J].

LEE, CT .

APPLIED PHYSICS B-PHOTOPHYSICS AND LASER CHEMISTRY, 1984, 35 (02) :113-118

[7] CONTROLLED TEXTURE OF REACTIVELY RF-SPUTTERED ZNO THIN-FILMS [J].

MANIV, S ;

ZANGVIL, A .

JOURNAL OF APPLIED PHYSICS, 1978, 49 (05) :2787-2792

[8]

SANKUR H, J VAC SCI TECHNOL A, V1, P1806

[9]

SUHARA T, 1986, IEEE J QUANTUM ELECT, V32, P845

[10]

TSAI CS, 1979, IEEE T CIRCUITS SYST, V26, P1072, DOI 10.1109/TCS.1979.1084598

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