CONTROLLED TEXTURE OF REACTIVELY RF-SPUTTERED ZNO THIN-FILMS

被引：102

作者：

MANIV, S ^{[1
]}

ZANGVIL, A ^{[1
]}

机构：

[1] UNIV NEGEV, DEPT MAT ENGN, BEER SHEVA 84120, ISRAEL

来源：

JOURNAL OF APPLIED PHYSICS | 1978年 / 49卷 / 05期

关键词：

D O I：

10.1063/1.325158

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2787 / 2792

页数：6

共 12 条

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[2]

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THIN SOLID FILMS, 1971, 7 (02) :135-&

[5] REACTIVE SPUTTERING OF METALS IN OXIDIZING ATMOSPHERES [J].

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THIN SOLID FILMS, 1973, 7 (02) :163-176

[6] MICROSTRUCTURE OF ZNO FILMS USED FOR ACOUSTIC SURFACE-WAVE GENERATION [J].

HICKERNELL, FS .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (04) :879-883

[7] ZINC-OXIDE THIN-FILM SURFACE-WAVE TRANSDUCERS [J].

HICKERNELL, FS .

PROCEEDINGS OF THE IEEE, 1976, 64 (05) :631-635

[8] STUDIES OF OPTIMUM CONDITIONS FOR GROWTH OF RF-SPUTTERED ZNO FILMS [J].

KHURIYAKUB, BT ;

KINO, GS ;

GALLE, P .

JOURNAL OF APPLIED PHYSICS, 1975, 46 (08) :3266-3272

[9]

LEHMANN HW, 1974, JPN J APPL PHYS, P741

[10]

MANIV S, 1976, B ISR PHYS SOC, V22, P88

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