Characterisation and performance of partially filtered arc TiAlN coatings

被引:63
作者
Vlasveld, AC [1 ]
Harris, SG
Doyle, ED
Lewis, DB
Munz, WD
机构
[1] Swinburne Univ Technol, Sch Engn & Sci, Hawthorn, Vic, Australia
[2] Sheffield Hallam Univ, Inst Mat Res, Sheffield S1 1WB, S Yorkshire, England
关键词
residual stress; physical vapour deposited (PVD) coatings; thin film PVD coatings;
D O I
10.1016/S0257-8972(01)01448-7
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
It is now being recognised that the level of residual stress in physical vapour deposited (PVD) coatings is yet another important physical property of thin film PVD coating parameters that can critically affect their performance. In this study, titanium aluminium nitride (TiAIN) coatings were deposited using a dual source filtered arc evaporation system with a view to determine the effect of bias voltage increased from -50 to -250 V, the residual stress in the coating as well as the adhesion and cutting tool performance. The X-ray diffraction methods of Bragg-Brentano and glancing angle parallel beam (sin(2)psi) were used to study the texture and residual stress in the as-deposited coatings. The results showed that as the bias voltage increased from -50 to -250 V and the residual stress increased from 7.67 to 11.81 GPa (compressive). However, little change in residual stress was observed with an increase in are current from 75 to 175 A. All coatings exhibited a preferred orientation in the {111} direction, however, a reduction in the {111} intensity was observed for the coating deposited at -50 V. Coating hardness was observed to increase from 26.3 to 31.7 GPa when the bias voltage was increased from -50 to -150 V. However, no further increase was observed at -250 V. No effect on hardness was noted for any change in arc current. Scratch adhesion results showed little effect on the bias voltage with critical load values of 46, 48 and 43 N for the -50, -150 and -250 V biased coatings, respectively. However, increasing the arc currents above 75 A resulted in a reduction of critical load from 48 N for 75 A to 36 and 37 N for 125 and 175 A arc currents, respectively. Damiler Benz Rockwell 'C' adhesion tests carried out also revealed a similar trend. The Al content of the coating was found to decrease with increasing bias voltage but increase with an increase in arc current. Accelerated drill life tests suggested that an increase in residual stress associated with the higher bias voltages does affect tool life. For are current variation, the balance between intrinsic and extrinsic stresses that contribute to the total residual stress may affect cutting tool life. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:217 / 224
页数:8
相关论文
共 27 条
[1]  
[Anonymous], 1978, ELEMENTS XRAY DIFFRA
[2]  
BELL TJ, 1991, METROLOGIA, V28, P463
[3]   The mechanical and structural properties of Ti films prepared by filtered arc deposition [J].
Bendavid, A ;
Martin, PJ ;
Smith, GB ;
Wielunski, L ;
Kinder, TJ .
VACUUM, 1996, 47 (10) :1179-1188
[4]  
BENDAVID A, 1997, THESIS U SYDNEY
[5]   ION FLUX CHARACTERISTICS IN ARC VAPOR-DEPOSITION OF TIN [J].
BERGMAN, C .
SURFACE & COATINGS TECHNOLOGY, 1988, 36 (1-2) :243-255
[6]   MACROPARTICLE CONTAMINATION IN CATHODIC ARC COATINGS - GENERATION, TRANSPORT AND CONTROL [J].
BOXMAN, RL ;
GOLDSMITH, S .
SURFACE & COATINGS TECHNOLOGY, 1992, 52 (01) :39-50
[7]   CATHODE EROSION RATES IN VACUUM-ARC DISCHARGES [J].
BROWN, IG ;
SHIRAISHI, H .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1990, 18 (01) :170-171
[8]   (TI-AL)N ADVANCED FILMS PREPARED BY ARC PROCESS [J].
COLL, BF ;
FONTANA, R ;
GATES, A ;
SATHRUM, P .
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1991, 140 (1-2) :816-824
[9]  
DOYLE ED, 1998, MATER FORUM, V22, P77
[10]  
DOYLE ED, 1999, P INT C ADV MAT PROC