Stress profiles and thermal stability of CrxNy films deposited by magnetron sputtering

被引：36

作者：

Djouadi, MA ^{[1
]}

Nouveau, C

Banakh, O

Sanjinés, R

Lévy, F

Nouet, G

机构：

[1] Ecole Natl Super Arts & Metiers, LaBoMaP, F-71250 Cluny, France

[2] Ecole Polytech Fed Lausanne, Inst Appl Phys, CH-1015 Lausanne, Switzerland

[3] ISMRA Univ Caen, LERMAT, Caen, France

来源：

SURFACE & COATINGS TECHNOLOGY | 2002年 / 151卷

关键词：

chromium nitride; stress profiles; thermal stability;

D O I：

10.1016/S0257-8972(01)01635-8

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

CrN and Cr-2 coatings were synthesized by magnetron sputtering. The limiting factors for the application of these coatings for protecting cutting tools are their lack of adhesion and thermal stability. Therefore, a study of these two parameters has been conducted. First, the influence of the film thickness on the compressive stress and also on the mechanical and structural properties of the films were studied. The results showed that for both phases the stress is not homogeneous with the film thickness. Second, the thermal stability was investigated by post deposition annealing in nitrogen. It reveals that CrN and Cr2N films are stable when heated at temperatures up to 1000 K. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：510 / 514

页数：5

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