Oxidation of TIN, ZrN, TiZrN, CrN, TiCrN and TiN/CrN multilayer hard coatings reactively sputtered at low temperature

被引：116

作者：

Panjan, P ^{[1
]}

Navinsek, B ^{[1
]}

Cvelbar, A ^{[1
]}

Zalar, A ^{[1
]}

Milosev, I ^{[1
]}

机构：

[1] INST SURFACE TECHNOL & OPTOELECT, LJUBLJANA 1000, SLOVENIA

来源：

THIN SOLID FILMS | 1996年 / 281卷

关键词：

coatings; sputtering; plasma processing and deposition; oxidation;

D O I：

10.1016/0040-6090(96)08663-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

All the coatings and multilayer structures were deposited in a Sputron plasma-beam-sputtering apparatus at a temperature below 150 degrees C on polished alumina substrates (R(a)=25 nm) and polished tool steel discs. The coatings were annealed in an oxygen flow at temperatures in the range 500-850 degrees C. The oxidation kinetics of these coatings were studied by means of the weight gain as a function of the oxidation time at each temperature. On the same coatings, continuous in situ electrical resistivity measurements were taken and these indicate grain boundary oxidation. The composition and the depth profiles of the oxidation products formed were investigated using AES and XPS combined with sputter profiling. The oxide layers were found to grow according to a parabolic diffusion law with activation energies of 1.04, 1.89, 1.92, 2.37, 2.91 and 3.98 eV for Ti0.63Zr0.37N, TiN, CrN, ZrN, TiN/CrN and Cr0.72Ti0.28N, respectively.

引用

页码：298 / 301

页数：4

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