Fabrication of photonic crystals using a spin-coated hydrogen silsesquioxane hard mask

被引：23

作者：

O'Faolain, L ^{[1
]}

Kotlyar, MV ^{[1
]}

Tripathi, N ^{[1
]}

Wilson, R ^{[1
]}

Krauss, TF ^{[1
]}

机构：

[1] Univ St Andrews, Sch Phys & Astron, Ultrafast Photon Collaborat, St Andrews KY16 9SS, Fife, Scotland

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2006年 / 24卷 / 01期

基金：

英国工程与自然科学研究理事会;

关键词：

D O I：

10.1116/1.2164850

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We present a method for creating a hard mask for the dry etching of microphotonic structures and devices. We demonstrate that spin-on glass [hydrogen silsesquioxane (HSQ)] has sufficient dry etch resistance to allow the creation of high-quality, deeply etched photonic crystals. Furthermore, HSQ is a more favorable hard mask for the creation of active devices than plasma-enhanced chemical-vapor deposition (PECVD) silica, as less damage is incurred. It is also an economic and convenient replacement for PEVCD in photonic crystal fabrication. We examine this method and show that it can create photonic crystals of equivalent quality to those created using PEVCD masking. (c) 2006 American Vacuum Society.

引用

页码：336 / 339

页数：4

共 19 条

[1] Low loss, thin p-clad 980-nm InGaAs semiconductor laser diodes with an asymmetric structure design [J].

Buda, M ;

Hay, J ;

Tan, HH ;

Wong-Leung, J ;

Jagadish, C .

IEEE JOURNAL OF QUANTUM ELECTRONICS, 2003, 39 (05) :625-633

[2] Microdisk tunable resonant filters and switches [J].

Djordjev, K ;

Choi, SJ ;

Dapkus, PD .

IEEE PHOTONICS TECHNOLOGY LETTERS, 2002, 14 (06) :828-830

[3]

Ferrini R, 2002, ELECTRON LETT, V38, P962, DOI 10.1049/e1:20020666

[4] Two-dimensional photonic crystal coupled-defect laser diode [J].

Happ, TD ;

Kamp, M ;

Forchel, A ;

Gentner, JL ;

Goldstein, L .

APPLIED PHYSICS LETTERS, 2003, 82 (01) :4-6

[5] Electrooptic tuning of InP-based microphotonic Fabry-Perot filters [J].

Kotlyar, MV ;

O'Faolain, L ;

Krysa, AB ;

Krauss, TF .

JOURNAL OF LIGHTWAVE TECHNOLOGY, 2005, 23 (06) :2169-2174

[6] Compact polarization converter in InP-based material [J].

Kotlyar, MV ;

Bolla, L ;

Midrio, M ;

O'Faolain, L ;

Krauss, TF .

OPTICS EXPRESS, 2005, 13 (13) :5040-5045

[7] Electrically tunable multiquantum-well InGaAsP-InGaAsP microphotonic filter [J].

Kotlyar, MV ;

O'Faolain, L ;

Krysa, AB ;

Krauss, TF .

IEEE PHOTONICS TECHNOLOGY LETTERS, 2005, 17 (04) :837-839

[8] High-aspect-ratio chemically assisted ion-beam etching for photonic crystals using a high beam voltage-current ratio [J].

Kotlyar, MV ;

O'Faolain, L ;

Wilson, R ;

Krauss, TF .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2004, 22 (04) :1788-1791

[9] Effect of curing temperature on the mechanical properties of hydrogen silsesquioxane thin films [J].

Liou, HC ;

Pretzer, J .

THIN SOLID FILMS, 1998, 335 (1-2) :186-191

[10] Pattern transfer of a 23 nm-period grating and sub-15 nm dots into CVD diamond [J].

Lister, KA ;

Casey, BG ;

Dobson, PS ;

Thoms, S ;

Macintyre, DS ;

Wilkinson, CDW ;

Weaver, JMR .

MICROELECTRONIC ENGINEERING, 2004, 73-4 :319-322

← 1 2 →