UV cleaning of contaminated 157-nm reticles

被引：9

作者：

Bloomstein, TM ^{[1
]}

Liberman, V ^{[1
]}

Rothschild, M ^{[1
]}

Efremow, NN ^{[1
]}

Hardy, DE ^{[1
]}

Palmacci, ST ^{[1
]}

机构：

[1] MIT, Lincoln Lab, Lexington, MA 02420 USA

来源：

OPTICAL MICROLITHOGRAPHY XIV, PTS 1 AND 2 | 2001年 / 4346卷

关键词：

D O I：

10.1117/12.435764

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A UV-lamp-based cleaning station, serving as a load-lock to a VUV spectrometer, has been used to evaluate the cleaning of hydrocarbon residues on 157-nm reticles. UV lamp based cleaning is found to be an effective tool to remove both nanometer scale layers of physisorbed and significantly more resilient highly conjugated "graphitized" layers on the mask substrate. Slight changes in reflectance and surface roughness are observed on the chromium absorber indicating some degree of photo-oxidation is occurring during lamp cleaning.

引用

页码：669 / 675

页数：7

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