Comparison of the surface structure of carbon films deposited by different methods

被引：13

作者：

Niedzielski, P

Mitura, E

Mitura, S

Dluzniewski, M

Przymusiala, P

DerSahaguian, S

Staryga, E

Zak, J

Sokolowska, A

Szmidt, J

Stanishevsky, A

Moll, JJ

Moll, JA

机构：

[1] TECH UNIV LODZ, PL-90924 LODZ, POLAND

[2] SILESIAN TECH UNIV, PL-44100 GLIWICE, POLAND

[3] WARSAW UNIV TECHNOL, PL-00662 WARSAW, POLAND

[4] BELARUS ACAD SCI, PLASMOTEG ENGN CTR, MINSK 220141, BELARUS

[5] MED ACAD LODZ, PEDIAT CARDIAC SURG DEPT, PL-93338 LODZ, POLAND

来源：

关键词：

AFM; amorphous carbon films; surface morphology;

D O I：

10.1016/S0925-9635(96)00761-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Atomic force microscopy is used to estimate and compare surface morphology of the carbon coatings, prepared using radio frequency plasma chemical vapor deposition, pulsed cathodic are discharge, ion-beam deposition and hot-filament chemical vapor deposition. The difference in the surface structure was mentioned for each method of deposition. The influence of the surface morphology on the him properties is discussed. (C) 1997 Elsevier Science S.A.

引用

页码：721 / 724

页数：4

共 10 条

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ANGUS JC, 1986, PLASMA DEPOSITED THI

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