Valence force field analysis on nitrogen in silicon

被引:4
作者
Harada, H [1 ]
Ohkubo, I [1 ]
Mikayama, T [1 ]
Yamanaka, Y [1 ]
Inoue, N [1 ]
机构
[1] Osaka Prefecture Univ, RIAST, Sakai, Osaka 5998570, Japan
基金
日本学术振兴会;
关键词
nitrogen; silicon; molecular orbital; valence force; infrared absorption;
D O I
10.1016/S0921-4526(01)00684-6
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Nitrogen doping attracts attention because it reduces void defects drastically. But the mechanism has not been clarified yet. Various configurations of nitrogen have been proposed by using the first principles calculation but there is no description how the stress plays a role in determining these nitrogen configurations. We reveal normal vibration modes corresponding to well-known infrared absorption peaks at 766 and 963 cm(-1) of nitrogen split interstitial (N-N) and derive force constants for bond stretching and bond bending. Local strain energy near nitrogen is calculated for the optimized structures of N-N, nitrogen-vacancy complex, substitutional N and interstitial N. As a result, it is found that in structures of N-N and N-2-V-2 with filled electron orbitals, strain energy plays an important role in the determination of the stable structure. (C) 2001 Published by Elsevier Science B.V.
引用
收藏
页码:244 / 247
页数:4
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