High reliability non-hermetic 0.15 μm GaAs pseudomorphic HEMT MMIC amplifiers

被引:12
作者
Leung, DL [1 ]
Chou, YC [1 ]
Wu, CS [1 ]
Kono, R [1 ]
Scarpulla, J [1 ]
Lai, R [1 ]
Hoppe, M [1 ]
Streit, DC [1 ]
机构
[1] TRW Co Inc, Elect Syst & Technol Div, Redondo Beach, CA 90278 USA
来源
1999 IEEE RADIO FREQUENCY INTEGRATED CIRCUITS (RFIC) SYMPOSIUM - DIGEST OF PAPERS | 1999年
关键词
D O I
10.1109/RFIC.1999.805259
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
High reliability performance of a Ka-band low-noise MMIC amplifier fabricated using 0.15 mu m production AlGaAs/InGaAs/GaAs HEMT process technology is reported. Operating at an accelerated DC bias condition of Vds=5.2V and Ids=250mA/mm, two-stage balanced amplifiers were lifetested at three-temperatures (T-ambient=235 degrees C, T-ambient=250 degrees C, and T-ambient=265 degrees C) in air ambient. Failure time for each temperature was determined using Delta S21=-1.0 dB measured at room temperature as the failure criteria. The activation energy (Ea) is 1.6 eV, achieving a projected median-time-to-failure (MTF) of 7x10(9) hours at a 125 degrees C junction temperature. This is the first report of 0.15 mu m HEMT reliability based on S21 failure criteria of MMIC amplifiers under DC stress at high junction temperature in air ambient. This result demonstrates a robust HEMT technology immune to the stress effects of high electric field under high temperature operation suitable for non-hermetic commercial Ka-band applications.
引用
收藏
页码:153 / 156
页数:4
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