Energetics of self-interstitial clusters in Si

被引:302
作者
Cowern, NEB
Mannino, G
Stolk, PA
Roozeboom, F
Huizing, HGA
van Berkum, JGM
Cristiano, F
Claverie, A
Jaraíz, M
机构
[1] CNRS, CEMES, F-31055 Toulouse, France
[2] ETSIT, Dept Electicidad & Electron, Valladolid 47011, Spain
关键词
D O I
10.1103/PhysRevLett.82.4460
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The transient supersaturation in a system undergoing Ostwald ripening is related to the cluster formation energy E-fc as a function of cluster size n. We use this relation to study the energetics of self-interstitial clusters in Si. Measurements of transient enhanced diffusion of B in Si-implanted Si are used to determine S(t), and inverse modeling is used to derive E-fc(n). For clusters with n > 15, E-fc approximate to 0.8 eV, close to the fault energy of {113} defects. For clusters with n < 10, E-fc is typically 0.5 eV higher, but stabler clusters exist at n approximate to 4 (E-fc approximate to 1.0 eV) and n approximate to 8 (E-fc approximate to 0.6 eV). [S0031-9007(99)09311-4].
引用
收藏
页码:4460 / 4463
页数:4
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