Photolithographic generation of protein micropatterns for neuron culture applications

被引：149

作者：

Sorribas, H ^{[1
]}

Padeste, C ^{[1
]}

Tiefenauer, L ^{[1
]}

机构：

[1] Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland

来源：

BIOMATERIALS | 2002年 / 23卷 / 03期

关键词：

protein pattern; photolithography; neuronal networks;

D O I：

10.1016/S0142-9612(01)00199-5

中图分类号：

R318 [生物医学工程];

学科分类号：

0831 ;

摘要：

Standard positive photoresist techniques were adapted to generate micropatterns of proteins on glass and oxide surfaces. Both lift-off and plasma-etching techniques were used to transfer the photoresist pattern into a layer of covalently immobilised protein. The Surface properties of the areas adjacent to the patterns were altered by chemical surface modification. Using a combination of the lift-off and the etching process complementary patterns of two different proteins were generated. The biochemical and biological functionality of the protein patterns were assessed by immunostaining and by investigating the outgrowth of neurites from neurons plated on the patterned Substrates. The investigated patterning processes are compatible with microstructuring and thin film processes, and may be used to generate functional surfaces for sensor and neuron culture applications. (C) 2001 Elsevier Science Ltd. All rights reserved.

引用

页码：893 / 900

页数：8

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