Linear extended ArcJet-CVD - a new PECVD approach for continuous wide area coating under atmospheric pressure

A new type of DC-powered plasma source (LARGE) was developed and evaluated for continuous plasma-enhanced (PE) CVD under atmospheric pressure. The linear extended emanating plasma sheet was scaled up to various working widths with the result that a half meter range has already been achieved. A CVD reactor was designed for continuous deposition of' non-oxide materials. The reactor operates in a remote atmospheric pressure (AP) PECVD configuration with typical deposition rates of 5-50 nm s(-1) (static) and 0.1-1.0 nm in s(-1) (dynamic). The potential application range of the ArcJet-CVD technology was evaluated by screening studies with various substrates, (stainless steel, glass, silicon wafers) and coating materials (silica, carbon. silicon nitride). In-situ process characterization has been provided by both optical emission and Fourier transform infrared (FTIR) spectroscopy. A range of atomic and molecular intermediates, precursor fragments, and reaction products were identified, leading to the conclusion that a complete conversion of the element-organic precursors into an inorganic layer takes place.