Excimer-laser-induced densification in binary silica glasses

被引：23

作者：

Borrelli, NF ^{[1
]}

Smith, CM ^{[1
]}

Allan, DC ^{[1
]}

机构：

[1] Corning Inc, Div Sci & Technol, Corning, NY 14830 USA

来源：

OPTICS LETTERS | 1999年 / 24卷 / 20期

关键词：

D O I：

10.1364/OL.24.001401

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We report that the rate of excimer-laser-induced densification is a strong function of composition in the binary metal-oxide-silica system. The pulsed excimer-laser-induced densification rate is shown to increase with metal-oxide content. A good correlation was found between the densification rate and the relative softness of the glass, as indicated by the annealing temperature. : The densification rate for all the glasses was also found to be a strong function of the excimer-laser wavelength in the order 157 nm > 193 nm > 248 nm. (C) 1999 Optical Society of America OCIS codes: 140.3390, 160.2750, 160.4760.

引用

页码：1401 / 1403

页数：3

共 9 条

[1] 193-nm excimer-laser-induced densification of fused silica [J].

Allan, DC ;

Smith, C ;

Borrelli, NF ;

Seward, TP .

OPTICS LETTERS, 1996, 21 (24) :1960-1962

[2]

ALLAN DC, 1998, P SOC PHOTO-OPT INS, V3578, P16

[3] Densification of fused silica under 193-nm excitation [J].

Borrelli, NF ;

Smith, C ;

Allan, DC ;

Seward, TP .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 1997, 14 (07) :1606-1615

[4] Excimer-laser-induced densification of fused silica: laser-fluence and material-grade effects on the scaling law [J].

Liberman, V ;

Rothschild, M ;

Sedlacek, JHC ;

Uttaro, RS ;

Grenville, A .

JOURNAL OF NON-CRYSTALLINE SOLIDS, 1999, 244 (2-3) :159-171

[5] RADIATION COMPACTION OF VITREOUS SILICA [J].

PRIMAK, W ;

KAMPWIRTH, R .

JOURNAL OF APPLIED PHYSICS, 1968, 39 (12) :5651-+

[6] EFFECTS OF EXCIMER LASER IRRADIATION ON THE TRANSMISSION, INDEX OF REFRACTION, AND DENSITY OF ULTRAVIOLET GRADE FUSED-SILICA [J].

ROTHSCHILD, M ;

EHRLICH, DJ ;

SHAVER, DC .

APPLIED PHYSICS LETTERS, 1989, 55 (13) :1276-1278

[7] Material limitations to 193-nm lithographic system lifetimes [J].

Schenker, R ;

Piao, F ;

Oldham, WG .

OPTICAL MICROLITHOGRAPHY IX, 1996, 2726 :698-706

[8] Ultraviolet-induced densification in fused silica [J].

Schenker, RE ;

Oldham, WG .

JOURNAL OF APPLIED PHYSICS, 1997, 82 (03) :1065-1071

[9]

SMITH BW, 1997, OPT PHOTONICS NEWS, V8, P23

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