Excimer-laser-induced densification of fused silica: laser-fluence and material-grade effects on the scaling law

被引:27
作者
Liberman, V
Rothschild, M
Sedlacek, JHC
Uttaro, RS
Grenville, A
机构
[1] MIT, Lincoln Lab, Lexington, MA 02420 USA
[2] Intel Corp, Hillsboro, OR 97124 USA
关键词
D O I
10.1016/S0022-3093(99)00005-8
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We present results of the study of 193 nm laser-induced densification of fused silica as a function of incident laser fluence and pulse count. We describe an internally self-consistent experiment involving the simultaneous irradiation of 12 samples of two different grades, at fluences varying by two orders of magnitude and pulse counts exceeding 1.5 x 10(9). We are able to establish the existence of a dose-rate dependence of the densification phenomenon and to characterize the empirical rate constants as a function of fluence for two different grades of fused silica. (C) 1999 Published by Elsevier Science B.V. All rights reserved.
引用
收藏
页码:159 / 171
页数:13
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