Depth-graded multilayers for application in transmission geometry as linear zone plates

Fresnel zone plates for x-ray focusing optics are typically made using lithographic techniques. To achieve optimum efficiency for hard x rays, a depth of several microns is required, which limits the minimum zone width and hence minimum focal spot size achievable using lithography. We are exploring the fabrication of zone plates by an alternative technique that surmounts these limitations: the growth of a multilayer film to be used in transmission (Laue) diffraction geometry, in which the thickness of consecutive layers gradually increases according to the Fresnel zone formula; the film is sectioned after growth to the required depth. For a planar multilayer, this produces a linear zone plate that can focus x rays in one dimension. Here we report the growth and characterization of a depth-graded multilayer suitable for use as a zone plate for hard x-ray focusing. The multilayer has a total of 470 alternating layers of WSi2 and Si with thicknesses increasing monotonically from 15 to 60 nm, for a total thickness of 11.33 mu m. One of the major challenges is to understand and select the right material system for this kind of thick multilayer. We have found that WSi2/Si is a promising system. A comparison between WSi2/Si and W/Si multilayers is presented. (c) 2005 American Institute of Physics.