Coaxial Metal-Oxide-Semiconductor (MOS) Au/Ga2O3/GaN Nanowires

被引:26
作者
Hsieh, Chin-Hua [1 ]
Chang, Mu-Tung [1 ]
Chien, Yu-Jen [1 ]
Chou, Li-Jen [1 ]
Chen, Lih-Juann [1 ]
Chen, Chii-Dong [2 ]
机构
[1] Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 300, Taiwan
[2] Acad Sinica, Inst Phys, Taipei 115, Taiwan
关键词
D O I
10.1021/nl8016658
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Coaxial metal-oxide-semiconductor (MOS) Au-Ga2O3-GaN heterostructure nanowires were successfully fabricated by an in situ two-step process. The Au-Ga2O3 core-shell nanowires were first synthesized by the reaction of Ga powder, a mediated Au thin layer, and a SiO2 substrate at 800 degrees C. Subsequently, these core-shell nanowires were nitridized in ambient ammonia to form a GaN coating layer at 600 degrees C. The GaN shell is a single crystal, an atomic flat interface between the oxide and semiconductor that ensures that the high quality of the MOS device is achieved. These novel 1D nitride-based MOS nanowires may have promise as building blocks to the future nitride-based vertical nanodevices.
引用
收藏
页码:3288 / 3292
页数:5
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