High UV/visible contrast photodiodes based on epitaxial lateral overgrown GaN layers

被引:29
作者
Monroy, E [1 ]
Calle, F
Muñoz, E
Beaumont, B
Omnes, F
Gibart, P
机构
[1] Univ Politecn Madrid, ETSI Telecomunicac, Dept Ingn Elect, E-28040 Madrid, Spain
[2] CNRS, CRHEA, F-06560 Valbonne, France
关键词
D O I
10.1049/el:19991005
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Schottky photodiodes have been fabricated on epitaxial lateral overgrown GaN layers, showing a responsivity of 130mA/W. An improvement of one order of magnitude in the UV/visible contrast has been observed, in comparison with devices on standard GaN on sapphire. The significantly lower residual doping concentration reduces markedly the leakage current, and increases the detector bandwidth (> 30MHz in devices with a diameter phi = 200 mu m). Detectivities as high as 5 x 109 Hz(1/2)mW(-1) were obtained in photodiodes with phi = 400 mu m, working at -3.4V bias.
引用
收藏
页码:1488 / 1489
页数:2
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