The interplay of sputtering and oxidation during plasma diffusion treatment

被引：54

作者：

Parascandola, S ^{[1
]}

Kruse, O ^{[1
]}

Möller, W ^{[1
]}

机构：

[1] Rossendorf Inc, Forschungszentrum Rossendorf EV, Inst Ion Beam Phys & Mat Res, D-01314 Dresden, Germany

来源：

APPLIED PHYSICS LETTERS | 1999年 / 75卷 / 13期

关键词：

D O I：

10.1063/1.124849

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Metals that form dense native surface oxide layers challenge plasma diffusion treatment techniques. Experimental results obtained during nitriding of stainless steel from real-time depth-resolved compositional analysis by elastic recoil detection give insight into the transport kinetics. In agreement with semiquantitative considerations on the oxide removal and the oxide growth, the interplay of sputtering and oxidation emerges as a key parameter. On this background, suggestions for practical applications and optimization of the modification processes are given for different plasma diffusion treatment techniques. (C) 1999 American Institute of Physics. [S0003-6951(99)02339-6].

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页码：1851 / 1853

页数：3

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