Titanium disulphide thin film prepared by plasma-CVD for lithium secondary battery

Titanium disulphide fine power and preferred oriented thin film were prepared by plasma-CVD. The fine powder product was an aggregate of platelike crystallites of some 10 nm in width, and less than 10 nm in thickness. Crystalline orientation of TiS2 in the film was investigated in relation to deposition rate and film thickness. The preferred orientation of the TiS2 basal plane perpendicular to the substrate was obtained on films with a thickness of more than similar to 10 mu m at a deposition rate of similar to 4x10(-3) g/cm(2) h. Both the fine powder and the preferred orientation resulted in large discharge capacities in a lithium battery cathode application. (C) 1996 Elsevier Science Limited and Techna S.r.l.