High speed P-type SiGe modulation-doped field-effect transistors

被引:59
作者
Arafa, M
Fay, P
Ismail, K
Chu, JO
Meyerson, BS
Adesida, I
机构
[1] UNIV ILLINOIS,DEPT ELECT ENGN,URBANA,IL 61801
[2] CAIRO UNIV,FAC ENGN,DEPT ELECTR,GIZA 12211,EGYPT
[3] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
基金
美国国家科学基金会;
关键词
D O I
10.1109/55.485188
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report on the fabrication and characterization of high-speed p-type modulation-doped field-effect transistors (MODFET's) with 0.7-mu m and 1-mu m gate-lengths having unity current-gain cut-off frequencies (f(T)) of 9.5 GHz and 5.3 GHz, respectively, The devices were fabricated on a high hole mobility SiGe heterostructure grown by ultra-high-vacuum chemical vapor deposition (UHV-CVD). The de maximum extrinsic transconductance (g(m)) is 105 mS/mm (205 mS/mm) at room temperature (77 K) for the 0.7-mu m gate length devices, The fabricated devices show good pinch-off characteristics and have a very low gate leakage current of a few mu A/mm at room temperature and a few nA/mm at 77 K.
引用
收藏
页码:124 / 126
页数:3
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