Atomic layer deposition of titanium dioxide nanostructures using carbon nanosheets as a template

被引:19
作者
Rooth, Marten [1 ]
Quinlan, Ronald A. [2 ,4 ]
Widenkvist, Erika [1 ]
Lu, Jun [1 ]
Grennberg, Helena [3 ]
Holloway, Brian C. [4 ]
Harsta, Anders [1 ]
Jansson, Ulf [1 ]
机构
[1] Uppsala Univ, Angstrom Lab, Dept Chem Mat, SE-75121 Uppsala, Sweden
[2] Coll William & Mary, Dept Appl Sci, Williamsburg, VA 23187 USA
[3] Uppsala Univ, Dept Biochem & Organ Chem, SE-75123 Uppsala, Sweden
[4] Luna Innovat NanoWorks Div, Danville, VA 24541 USA
关键词
Nucleation; Atomic layer epitaxy; Nanomaterials; Oxides; CHEMICAL-VAPOR-DEPOSITION; TIO2; FILMS; THIN-FILMS; ANATASE;
D O I
10.1016/j.jcrysgro.2008.10.035
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Nanostructured films of anatase TiO2 is deposited on carbon nanosheet (CNS) templates using atomic layer deposition (ALD). The high-surface area of the CNS together with the unique step coverage of the ALD process makes it possible to obtain sheet-like TiO2 nanostructures, for use in potential applications, e.g. photocatalysis and photovoltaics. A problem with ALD on CNS was the low nucleation rate giving TiO2 films with pinholes. It is shown that introduction of defects by an acid-treatment process can be used to control initial nucleation and growth of the films. The TiO2 on the defect-rich CNS nucleates faster and results in a film with no observable pinholes consisting of crystalline grains in an amorphous matrix. (c) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:373 / 377
页数:5
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