Atomic layer deposition of titanium dioxide nanostructures using carbon nanosheets as a template

被引：19

作者：

Rooth, Marten ^{[1
]}

Quinlan, Ronald A. ^{[2
,4
]}

Widenkvist, Erika ^{[1
]}

Lu, Jun ^{[1
]}

Grennberg, Helena ^{[3
]}

Holloway, Brian C. ^{[4
]}

Harsta, Anders ^{[1
]}

Jansson, Ulf ^{[1
]}

机构：

[1] Uppsala Univ, Angstrom Lab, Dept Chem Mat, SE-75121 Uppsala, Sweden

[2] Coll William & Mary, Dept Appl Sci, Williamsburg, VA 23187 USA

[3] Uppsala Univ, Dept Biochem & Organ Chem, SE-75123 Uppsala, Sweden

[4] Luna Innovat NanoWorks Div, Danville, VA 24541 USA

来源：

JOURNAL OF CRYSTAL GROWTH | 2009年 / 311卷 / 02期

关键词：

Nucleation; Atomic layer epitaxy; Nanomaterials; Oxides; CHEMICAL-VAPOR-DEPOSITION; TIO2; FILMS; THIN-FILMS; ANATASE;

D O I：

10.1016/j.jcrysgro.2008.10.035

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

Nanostructured films of anatase TiO2 is deposited on carbon nanosheet (CNS) templates using atomic layer deposition (ALD). The high-surface area of the CNS together with the unique step coverage of the ALD process makes it possible to obtain sheet-like TiO2 nanostructures, for use in potential applications, e.g. photocatalysis and photovoltaics. A problem with ALD on CNS was the low nucleation rate giving TiO2 films with pinholes. It is shown that introduction of defects by an acid-treatment process can be used to control initial nucleation and growth of the films. The TiO2 on the defect-rich CNS nucleates faster and results in a film with no observable pinholes consisting of crystalline grains in an amorphous matrix. (c) 2008 Elsevier B.V. All rights reserved.

引用

页码：373 / 377

页数：5

共 16 条

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