Fermi-level dependence of the charge state of diffusing hydrogen in amorphous silicon

被引:15
作者
Branz, HM [1 ]
Reedy, R [1 ]
Crandall, RS [1 ]
Mahan, H [1 ]
Xu, YQ [1 ]
Nelson, BP [1 ]
机构
[1] Natl Renewable Energy Lab, Golden, CO 80401 USA
关键词
D O I
10.1016/S0022-3093(01)01161-9
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We observe that the charge state of diffusing hydrogen depends upon the electronic Fermi level (Er) in hydrogenated amorphous silicon (a-Si:H). We incorporate a thin layer of deuterium (H-2) at various positions between the n- and p-layers of i-n-i-p-i structures on crystalline silicon substrates. The electric field (T) is above 6 x 10(4) V/cm at each H-2 layer. After annealing, marked asymmetries in the secondary ion mass spectrometry profiles of diffused deuterium are observed. With the H-2 layer placed near the p-layer (E-f near the valence band), diffusion is into the p-layer. indicating H+ moving with F. With the H-2 layer near the n-layer (E-f near the conduction band), most diffusion is into the n-layer, indicating H- moving against F. Because the Si-H bond is neutral, the charged diffusing species must be emitted mobile H. We estimate an effective correlation energy of 0.4 +/- 0.1 eV for the mobile H. (C) 2002 Published by Elsevier Science B. V.
引用
收藏
页码:191 / 195
页数:5
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