Control of thermochromic spectrum in vanadium dioxide by amorphous silicon suboxide layer

被引:84
作者
Kakiuchida, Hiroshi [1 ]
Jin, Ping [1 ]
Tazawa, Masato [1 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, Moriyama Ku, Mat Res Inst Sustainable Dev, Nagoya, Aichi 4638560, Japan
关键词
vanadium dioxide; amorphous silicon; silicon suboxide; thermochromism; semiconductor-to-metal phase transition; reactive rf magnetron sputtering; optical constants; ellipsometry;
D O I
10.1016/j.solmat.2008.04.025
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Vanadium dioxide (VO2) is a promising candidate for various thermochromic devices. Layering M film with amorphous silicon suboxide (a-SiOx) is an effective approach for controlling the thermochromic spectrum efficiently, since a-SiOx possesses an easily adjustable refractive index over a wide range. However, the crystalline quality of VO2 is so sensitive to under- and/or over-coated materials that the a-SiOx coatings may be disadvantageous with respect to material suitability. In this study, the controllability of the thermochromic spectrum of VO2 by employing a-SiOx layer was evaluated under several fabrication conditions and, as a result, it was found that an a-SiOx layer can control thermochromism well without any decline in the stability of VO2 crystalline growth, which strongly suggests the possibility of expansion in the optical design for efficient thermochromic control. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:1279 / 1284
页数:6
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