Tuning the magnetic coupling across ultrathin antiferromagnetic films by controlling atomic-scale roughness

被引:147
作者
Kuch, W
Chelaru, LI
Offi, F
Wang, J
Kotsugi, M
Kirschner, J
机构
[1] Max Planck Inst Mikrostrukturphys, D-06120 Halle, Germany
[2] Free Univ Berlin, Inst Expt Phys, D-14195 Berlin, Germany
关键词
D O I
10.1038/nmat1548
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Characterization and control of the interface structure and morphology at the atomic level is an important issue in understanding the magnetic interaction between an antiferromagnetic material and an adjacent ferromagnet in detail, because the atomic spins in an antiferromagnet change direction on the length scale of nearest atomic distances. Despite its technological importance for the development of advanced magnetic data-storage devices and extensive studies, the details of the magnetic interface coupling between antiferromagnets and ferromagnets have remained concealed. Here we present the results of magneto-optical Kerr-effect measurements and layer-resolved spectro-microscopic magnetic domain imaging of single-crystalline ferromagnet - antiferromagnet ferromagnet trilayers. Atomic-level control of the interface morphology is achieved by systematically varying the thicknesses of the bottom ferromagnetic and the antiferromagnetic layer. We find that the magnetic coupling across the interface is mediated by step edges of single-atom height, whereas atomically. at areas do not contribute.
引用
收藏
页码:128 / 133
页数:6
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