共 19 条
[2]
Raman analysis of wurtzite silicon islands in silicon oxide deposited in N2O-SiH4 plasma process
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS,
2000, 39 (2B)
:L141-L142
[3]
XPS study of CVD silicon thin films deposited on various substrates from SiH4 gaseous precursor
[J].
JOURNAL DE PHYSIQUE IV,
1999, 9 (P8)
:1139-1145
[9]
LANDA G, COMMUNICATION
[10]
Defect studies in as-deposited and processed nanocrystalline Si/SiO2 structures
[J].
PHYSICAL REVIEW B,
1998, 58 (23)
:15632-15635