Vibrational and electronic properties of stabilized wurtzite-like silicon

被引:39
作者
Bandet, J
Despax, B
Caumont, T
机构
[1] CNRS, UMR 5477, LPST, Phys Solides Lab, F-31062 Toulouse 04, France
[2] LGET, UMR 5003, Lab Genie Elect, F-31062 Toulouse, France
关键词
D O I
10.1088/0022-3727/35/3/311
中图分类号
O59 [应用物理学];
学科分类号
摘要
Microcrystallites of hexagonal silicon (Si) have been deposited during the elaboration of SiO2 films. A good quality crystallographic structure is clearly identified in this uncommon material through microdiffraction, Raman scattering and photoluminescence techniques. Raman spectra exhibit two lines, one in crossed polarizations and the other in parallel polarizations. The temperature effect on phonon frequencies is discussed. The optical gap, estimated until now only through calculations, is found to be 1.45 eV at a temperature of -140degreesC. We propose that a grain silicon oxide coating plays a crucial role in the stabilization of this metastable phase of Si.
引用
收藏
页码:234 / 239
页数:6
相关论文
共 19 条
[1]   VIBRATIONAL PROPERTIES OF AMORPHOUS SI AND GE [J].
ALBEN, R ;
WEAIRE, D ;
SMITH, JE ;
BRODSKY, MH .
PHYSICAL REVIEW B, 1975, 11 (06) :2271-2296
[2]   Raman analysis of wurtzite silicon islands in silicon oxide deposited in N2O-SiH4 plasma process [J].
Bandet, J ;
Despax, B ;
Caumont, M ;
Date, L .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2000, 39 (2B) :L141-L142
[3]   XPS study of CVD silicon thin films deposited on various substrates from SiH4 gaseous precursor [J].
Berjoan, R ;
Perarnau, D ;
Caussat, B .
JOURNAL DE PHYSIQUE IV, 1999, 9 (P8) :1139-1145
[4]   Raman microspectroscopy study of processing-induced phase transformations and residual stress in silicon [J].
Gogotsi, Y ;
Baek, C ;
Kirscht, F .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1999, 14 (10) :936-944
[5]   Optical properties of Si clusters and Si nanocrystallites in high-temperature annealed SiOx films [J].
Inokuma, T ;
Wakayama, Y ;
Muramoto, T ;
Aoki, R ;
Kurata, Y ;
Hasegawa, S .
JOURNAL OF APPLIED PHYSICS, 1998, 83 (04) :2228-2234
[6]   ELECTRONIC PROPERTIES OF COMPLEX CRYSTALLINE AND AMORPHOUS PHASES OF GE AND SI .1. DENSITY OF STATES AND BAND STRUCTURES [J].
JOANNOPOULOS, JD ;
COHEN, ML .
PHYSICAL REVIEW B, 1973, 7 (06) :2644-2657
[7]   Phase transformations of silicon caused by contact loading [J].
Kailer, A ;
Gogotsi, YG ;
Nickel, KG .
JOURNAL OF APPLIED PHYSICS, 1997, 81 (07) :3057-3063
[8]   RAMAN-SPECTRUM OF WURTZITE SILICON [J].
KOBLISKA, RJ ;
SOLIN, SA .
PHYSICAL REVIEW B, 1973, 8 (08) :3799-3802
[9]  
LANDA G, COMMUNICATION
[10]   Defect studies in as-deposited and processed nanocrystalline Si/SiO2 structures [J].
Prokes, SM ;
Carlos, WE ;
Veprek, S ;
Ossadnik, C .
PHYSICAL REVIEW B, 1998, 58 (23) :15632-15635